Speakers at Europe’s second international conference on CMOS variability reached the consensus that by working together and applying new working practices, industry could and would evolve to successfully tackle the challenges presented by CMOS variability at leading edge process geometries. 

Hosted at Savoy Place, London by The National Microelectronics Institute (NMI), in collaboration with the UK’s nanoCMOS Consortium, ICCV 2009 “Living with Variability” attracted expert speakers from around the world and an international audience representing chip designers, manufacturers and tool vendors.

Paul Jarvie, the NMI’s conference organiser said, “It is clear from the conference that all participants recognise that CMOS variability is very much a real world issue and that new approaches to design and manufacture are required and achievable.  It is also accepted that this is an issue that no one group can address in isolation and I’m convinced that global events like ICCV are vital in bringing together industry communities to promote dialogue and debate and to find solutions.”

The conference proceedings are available free to NMI members or can be purchased by contacting NMI  http://www.nmi.org.uk/nmi/contact